reactive ion etching systems, rf generators

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 Collection of links to journals and sites, containing information on plasma and vacuum technology, reactive ion etching.

 

Journals:

http://www.avs.org/JVST/jvsta.html  - Journal of Vacuum Science and Technology

 

 

http://jjap.ipap.jp/online/  - Japanese Journal of Applied Physics

 

 

http://sst.pennnet.com/home.cfm  - Solid State Technology

 

http://www.iop.org/EJ/S/UNREG/8i19OoT9rEKOdMHRYY3t4g/journal/0963-0252/1  - Plasma Sources Science and Technology

 

Sites:

 

http://www.oxford-instruments.com/  - Oxford Instruments

 

http://www.ime.org.sg/index.asp  - Institute of Microelectronics

 

MEMS.ru      -         Micro-electromechanical Systems

http://www.samcointl.com/prod/RIE-1C/index.html     -     reactive ion etching system


http://www.memsguide.com/MEMSequipments-Etchingprocess_dry_RIE.htm     -     Microelectromechanical Systems  ( MEMS)   guide

http://plasmalab.berkeley.edu/publications/wengrow/application_of_a_pulsed_rf-driven_multicusp_source.pdf


 

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